Fig. 1
From: Visualizing the ultra-structure of microorganisms using table-top extreme ultraviolet imaging
Schematic setup of the position-correlated EUV/IR ptychographic microscope. a and b show the IR and EUV ptychographic setup. GIPs: grazing incident plates. ML mirrors: multilayer mirrors. M: mask. S: sample. c Scanning electron microscope (SEM) image of the amplitude-only masks which are used to structure the IR and EUV beam respectively. For the IR mask (left spiral in c) a diameter of 300 μm was used and for the EUV mask (right in c) a diameter of 10 μm was used. The inset in c shows an enlarged SEM image of the EUV mask for illustration. The distance between the two masks is 700 μm. d Reconstructed complex probe back-propagated to the mask plane in IR scan. e Reconstructed probe back-propagated to the mask plane in EUV scan