Fig. 2

a Schematic of the designed all-fiber device, which consists of an external fiber, an on-chip fiber with a holder, and an SNSPD. b Mechanical polishing for very-large-scale on-chip fibers. Inset: An on-chip fiber. In the experiment, we use nine on-chip fibers on the quartz holder. c Schematic of the fabrication process of the all-fiber device. i, Cleaning up the on-chip fiber. ii, Magnetron sputtering of the film. Iii, Spin-coating the photoresist and lithography. iv, Lift-off Au maker. v, Spin-coating and using EBL. vi, Developer. vii, Reactive ion etching for pattern transfer. Vii, Removal of excess PMMA