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Fig. 5 | PhotoniX

Fig. 5

From: Single-color peripheral photoinhibition lithography of nanophotonic structures

Fig. 5

Design, fabrication, and characterization of the spin-decoupled metasurface. a Schematic of the spin-decoupled metasurface. Different spins are transformed into two separated foci. b Nanorod orientation profile of the targeted spin-decoupled metasurface. c-e Scanning electron microscope (SEM) image of the spin-decoupled metasurface fabricated by SC-PPI, together with magnifications (d and e) of the SEM images of the specified areas. g Simulated and measured focusing patterns for different spins. h Simulated and measured intensity profiles for LCP and RCP incident light. The full width at half-maximum of both intensity profiles is 815 nm

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