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Fig. 1 | PhotoniX

Fig. 1

From: Single-color peripheral photoinhibition lithography of nanophotonic structures

Fig. 1

Single-color peripheral photoinhibition lithography system. a Optical setup. CW: continuous wave, AOM: acoustic optical modulator, PBS: polarizing beam splitter, SLM: spatial light modulator, Q1 & Q2: quarter-wave plates, H1: half-wave plate, M: mirror. b The laser focus was measured by scanning a 150-nm-diameter gold bead in three dimensions. Cuts within the x–y and x–z plane are presented. c Simulated and experimental intensity distribution of the solid-shaped excitation beam and doughnut-shaped inhibition beam. d, e Images of light scattered from 150 nm diameter gold beads over a FOV of 100 × 100 μm2 in SC-PPI (d) and two-color PPI (e). The coordinates at the bottom of each subplot indicate the center positions of each region. The units of the coordinates in d and e are microns. Scale bar: 200 nm

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