Fig. 2From: Vacuum-ultraviolet (λ < 200 nm) photodetector arrayFabrication of the AlN-based 8 × 8 VUV PD array. a Device fabrication process, which is divided into five steps. Step 1 is the patterning and plating of the semi-transparent window Pt electrode; Step 2 is the patterning and plating of grid lines, down-leads and edge electrodes; Step 3 is the photoresist patterning to cover the non-photosensitive region; Step 4 is the bottom electrode plating; Step 5 should be the bonding and packaging of the PD array. b Photograph and c microscopic images of the AlN PD array. Since Pt electrodes are too transparent to be observed, the Pt electrode regions are marked by blue squaresBack to article page