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Fig. 6 | PhotoniX

Fig. 6

From: Imaging based on metalenses

Fig. 6

Large area fabrications of metalens. (a) A schematic diagram showing the production of the proposed metalenses at low cost and with high yield using existing photolithographic stepper technology. Here a wafer substrate is first deposited with the appropriate film stack, comprised of the metalens material (amorphous a-Si), photoresist (SPR700–1.0), and contrast enhancement material (CEM). Right panel: a photo of fabricated metalens, 2-cm in diameter, using this methodology [72]. (b) Schematic representation of the designed tunable metalens system comprising two cubic metasurface phase plates actuated laterally [73]. (c) Schematic of the process flow for fabricating multiple large area metalenses in parallel using high-throughput stepper lithography-based processing [73]

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